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The Image 34.7.1.1 Phototools. It seems obvious that artwork is the first defining step of the image. If the phototool lacks definition, integrity, or dimensional stability, there is no possibility of improving the image in subsequent processing. The edge definition and contrast are particularly important. Images of multiple pulses or spots must be overlapped so that there is minimum waviness of edges. As the feature to be resolved becomes smaller, the image must have better and cleaner integrity. It is desired that the artwork be at least an order of magnitude (factor of 10) better than the final tolerance required for the final product. Therefore, if the line tolerance is 0.0001 in, then the artwork should be 0.00001 in.

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34712 Image Integrity The effectiveness of the image translated from the artwork/ exposure process can be best achieved by optimization through all of the processing Surface preparation, resist application, exposure, handling, development, and cleanliness must be maintained sufficiently to produce images with proper integrity Image integrity may be gauged periodically with a resource such as the Conductor Analysis Technologies etch evaluation protocol Defects such as shorts and opens have been determined to be related to resist integrity, and persistent linewidth repeating patterns may be image related General concepts indicate that the thinner the resist, the shorter the light path; and the less optical interface layers between the light source and the copper surface, the better fidelity of the image to the phototool.

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However, constant improvement in film, exposure, and phototool products makes fine-image options dependent on proper optimization and constancy of technique and cleanliness as well as choice of technology 3472 Basics of Processing 34721 Diffusion The Controlling Mechanism In Sec 344, the chemical reactions of the etching process are discussed In order to understand the formation of the actual shapes of the foil cross section, the influences of diffusion and fluid flow must be understood32 As a result of the etching reaction at the reaction point on the copper surface, a complex ion concentration is built up and active etching chemicals are depleted In order to complete the reaction, this complex ion must move through a static boundary layer into a place where there is fresh etchant supplied to complete the reaction and carry away the etched product (See Fig 343.

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Whenever level cont rol is to be effected on a boiling liquid or condensing vapor, properties more typical of t,hermaI processes appear. Transfer of both heat and mass is involved, which, combined with the integration of flow into level, renders cont rol surprisingly difficult. Level control in boilers and distillation columns is sufficient ly problematic to warrant special consideration, which is given in Chaps. 8, 9, and 11.

(14.3)

) This boundary-layer shape is dependent on the specific shape of the resist and etching wall, the fluid flow over the surface, and the critical fluid flow in the channels formed by the resist and the etched side wall 34722 Fluid Flow Contribution Examination of Fig 343 shows that the contour of the boundary layer and its thickness vary with the shape and narrowness of the channel If the surface is flat with no resist image, the boundary layer is thin and only dependent on the fluid properties and velocity across the surface On the other hand, with resist images forming channels with depth, and the etched copper forming further channels, it is easy to see how the flow of fluid in the channel can be much different than the surface flow.

In order to make matters even more confusing, the circuit traces and resist images form actual channels in the surface..

FIGURJZ14-1

Much like a river bottom, the fluid flow in these individual channels is influenced by but different from the overall surface flow. In general, the narrower and deeper the channel, the slower the flow; and, critically, the diffusion boundary layer is more significant and etchant slows. In general terms, this is the reason that the middle section of a group of parallel, closely spaced lines etches slower than the outside lines. Similarly, this is the reason why a sharp 90 angle has a slower-etching section in the inside edge of the bend. The concept of spray etching adds another dimension to the fluid dynamics. The surface of the panel is never really free of a liquid film. The top side of a panel has the etch liquid held up between delivery by the sprays and removal by flow off the edges. This flow is influenced by the number, flow, and pattern of the nozzles, the interaction of the flow between the sprays, the motion of the panels, and the effects of rollers and other contacting and shadowing objects. Even the bottom side retains fluid by surface tension and is influenced by the amount of liquid moving under the direction of the nozzles. The end result is complicated flow patterns that are the result of testing and optimization by the machine manufacturers.